Nanometer precision metrology of submicron Cu/SiO2 interconnects using fluorescence and transmission x-ray microscopy
- Guangyong Xu
- D.E. Eastman
- et al.
- 2003
- Journal of Applied Physics
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Quantitative nanoscale metrology study of Cu/SiO2 interconnect technology using transmission x-ray microscopy
- X. Su
- C.B. Stagarescu
- et al.
- 2000
- Applied Physics Letters