Current Developments of a High Performance CA Resist for Mask Making Application
- Wu-Song Huang
- Wei He
- et al.
- 2003
- Photomask and Next-Generation Lithography Mask Technology 2003
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Nanocomposite resist systems for next generation lithography
- L. Merhari
- K.E. Gonsalves
- et al.
- 2002
- Microelectronic Engineering