Evaluation of the defense advanced lithography program (DALP) X-ray lithography aligner
- A.C. Chen
- A. Flamholz
- et al.
- 1997
- Microlithography 1997
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4 results for A. Flamholz
Thermomechanical distortions of the PREVAIL mask system during exposure
- P.-T. Lee
- C. Martin
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
X-ray lithography for ≤100 nm ground rules in complex patterns
- Scott Hector
- Victor Pol
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Measurement of the effective wavelength of x-ray lithography sources
- Juan R. Maldonado
- Inna Babich
- et al.
- 1993
- Microelectronic Engineering