Polymer platform dependent characteristics of 193 nm photoresists
- Juliann Opitz
- R.D. Allen
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
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4 results for Narayan Sundararajan
Diffusion and distribution studies of photoacid generators: Ion beam analysis in lithography
- Narayan Sundararajan
- Christopher F. Keimel
- et al.
- 1999
- J. Photopolym. Sci. Tech.
Diffusion and distribution of photoacid generators in thin polymer films
- Qinghuang Lin
- Marie Angelopoulos
- et al.
- 2000
- Materials Research Society Symposium - Proceedings
Supercritical CO2 processing for submicron imaging of fluoropolymers
- Narayan Sundararajan
- Shu Yang
- et al.
- 1999
- Chemistry of Materials