Failure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Microelectronic Manufacturing 2003
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3 results for Ben Vampatella
Failure prediction across process window for robust OPC
- Shumay D. Shang
- Yuri Granik
- et al.
- 2003
- SPIE Advanced Lithography 2003
Evaluation of the defense advanced lithography program (DALP) X-ray lithography aligner
- A.C. Chen
- A. Flamholz
- et al.
- 1997
- Microlithography 1997