Evaluation of the defense advanced lithography program (DALP) X-ray lithography aligner
- A.C. Chen
- A. Flamholz
- et al.
- 1997
- Microlithography 1997
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X-ray lithography for ≤100 nm ground rules in complex patterns
- Scott Hector
- Victor Pol
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures