Synthesis, characterization, and lithographic behavior of methylated poly(4-hydroxystyrene)
- D.R. McKean
- T.P. Sauer
- et al.
- 1990
- ACS Division of Polymer Chemistry Washington DC Meeting 1990
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Modified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists
- G. Pawlowski
- T.P. Sauer
- et al.
- 1990
- Microlithography 1990