Accurate method of measuring specific contact resistivity of interface between silicide and silicon and its application
- Kazuya Ohuchi
- Christian Lavoie
- et al.
- 2012
- Japanese Journal of Applied Physics
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196 results for Christian Lavoie
The thermally-induced reaction of thin Ni films with Si: Effect of the substrate orientation
- Simon Gaudet
- Patrick Desjardins
- et al.
- 2011
- Journal of Applied Physics
Epitaxy of ultrathin NiSi2 films with predetermined thickness
- Xindong Gao
- Joakim Andersson
- et al.
- 2011
- Electrochemical and Solid-State Letters
Phase formation and texture of nickel silicides on Si1-xC x epilayers
- K. De Keyser
- B. De Schutter
- et al.
- 2011
- Microelectronic Engineering
Exploitation of a self-limiting process for reproducible formation of ultrathin Ni1-x Ptx silicide films
- Zhen Zhang
- Bin Yang
- et al.
- 2010
- Applied Physics Letters
Texture of CoSi2 films on Si(111), (110) and (001) substrates
- K. De Keyser
- C. Detavernier
- et al.
- 2010
- Thin Solid Films
Formation of nickel silicide from direct-liquid-injection chemical-vapor-deposited nickel nitride films
- Zhefeng Li
- Roy G. Gordon
- et al.
- 2010
- JES
Metastable phase formation during the reaction of Ni films with Si(001): The role of texture inheritance
- Simon Gaudet
- C. Coia
- et al.
- 2010
- Journal of Applied Physics
Phase formation and thermal stability of ultrathin nickel-silicides on Si(100)
- K. De Keyser
- C. Van Bockstael
- et al.
- 2010
- Applied Physics Letters
In situ x-ray diffraction study of graphitic carbon formed during heating and cooling of amorphous-C/Ni bilayers
- Katherine Saenger
- James C. Tsang
- et al.
- 2010
- Applied Physics Letters