Flowable Chemical Vapor Deposition of Lightly Porous Low k SiCOH Dielectrics—Remote Plasma Deposition Processing, Film Analysis and Gap-Fill Application in Nano Device FabricationSon NguyenThomas Haighet al.2022MRS Fall Meeting 2022
Scatterometry based methodologies for characterization of MRAM technologyManasa MedikondaDaniel Schmidtet al.2022SPIE Advanced Lithography 2022
Exploration of pillar local CDU improvement options for AI applicationsCharlie LiuHao Tanget al.2020SPIE Advanced Lithography 2020