Reply to comment on "disproving a silicon analog of an alkyne with the aid of topological analyses of the electronic structure and ab initio molecular dynamics calculations"Carlo A. PignedoliAlessandro Curioniet al.2006ChemPhysChem
Electron mobility dependence on annealing temperature of W/HfO 2 gate stacks: The role of the interfacial layerA.C. CallegariP. Jamisonet al.2006Journal of Applied Physics
Disproving a silicon analog of an alkyne with the aid of topological analyses of the electronic structure and ab initio molecular dynamics calculationsCarlo A. PignedoliAlessandro Curioniet al.2005ChemPhysChem