New environmentally stable positive tone chemically amplified resist system - KRS
- Wu-Song Huang
- R.W. Kwong
- et al.
- 1993
- MRS Fall Meeting 1993
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9 results for A. Katnani
Junction profiling on hot carrier stressed device by dual lens electron holography and scanning capacitance microscopy
- Yun-Yu Wang
- J. Nxumalo
- et al.
- 2018
- IWJT 2018
Characterizing junction profiles in Ge photodetectors using scanning capacitance microscopy (SCM) and electron holography
- J. Nxumalo
- Yun-Yu Wang
- et al.
- 2018
- IWJT 2018
Extension of 248 nm optical lithography: A thin film imaging approach
- Qinghuang Lin
- Ahmad D. Katnani
- et al.
- 1998
- Microlithography 1998
Photoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers
- Wu-Song Huang
- Ratnam Sooriyakumaran
- et al.
- 1998
- Microlithography 1998
Positive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998
A method to improve setup and overlay performance on an excimer laser stepper using a unique DUV resist-KRS
- Karen Petrillo
- James Brancaccio
- et al.
- 1997
- Microlithography 1997
Effect of hot carrier stress on device junctions measured by electron holography and scanning capacitance microscopy
- Yun-Yu Wang
- J. Nxumalo
- et al.
- 2018
- Applied Physics Letters
Improved underlayers for acid amplified resists
- H.S. Sachdev
- R.W. Kwong
- et al.
- 1994
- Microelectronic Engineering