Line edge roughness reduction for 7nm metals
- Zheng Chen
- Steve McDermott
- et al.
- 2018
- SPIE Advanced Lithography 2018
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10 results for Bradley Morgenfeld
Strategies for single patterning of contacts for 32nm and 28nm technology
- Bradley Morgenfeld
- Ian Stobert
- et al.
- 2011
- ASMC 2011
Contact patterning strategies for 32nm and 28nm technology
- Bradley Morgenfeld
- Ian Stobert
- et al.
- 2011
- SPIE Advanced Lithography 2011
Single exposure contacts are dead. Long live single exposure contacts!
- Henning Haffner
- Martin Ostermayr
- et al.
- 2011
- SPIE Advanced Lithography 2011
Characterization of novel TiN/HfO2 metal insulator semiconductor stack for 32nm eDRAM
- Puneet Goyal
- Sneha Gupta
- et al.
- 2010
- IEEE International SOI Conference 2010
Benefits and trade-offs of global source optimization in optical lithography
- Kehan Tian
- Azalia Krasnoperova
- et al.
- 2009
- SPIE Advanced Lithography 2009
Contact mask optimization and SRAF design
- Uwe P. Schroeder
- Cyrus Tabery
- et al.
- 2009
- SPIE Advanced Lithography 2009
32 NM Logic patterning options with immersion lithography
- K. Lai
- S. Burns
- et al.
- 2008
- SPIE Advanced Lithography 2008
E-beam hot spot inspection for early detection of systematic patterning problems for a 22 nm SOI technology
- Oliver D. Patterson
- Deborah A. Ryan
- et al.
- 2014
- IEEE Trans Semicond Manuf
Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- Greg McIntyre
- Michael Hibbs
- et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS