Development of amorphous silicon based EUV hardmasks through physical vapor deposition
- Anuja De Silva
- Yann Mignot
- et al.
- 2017
- SPIE Photomask Technology + EUV Lithography 2017
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Directed self-assembly defectivity assessment. Part II
- Chris Bencher
- He Yi
- et al.
- 2012
- SPIE Advanced Lithography 2012