Silicon photonics and challenges for fabricationN. FeilchenfeldKaren Nummyet al.2017SPIE Advanced Lithography 2017
Post implant strip optimization for 90nm and beyond technologiesNicholas C. M. FullerAnthony Santiagoet al.2006ASMC 2006
Trimming of hard-masks by gaseous chemical oxide removal (COR) for sub-10nm gates/fins, for gate length control and for embedded logicWesley C. NatzleDavid Horaket al.2004ASMC 2004