Silsesquioxane-based photo-patternable porous low-k
- Dielectric Materials
- Jitendra S. Rathore
- et al.
- 2010
- MRS Spring Meeting 2010
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9 results for Jitendra S. Rathore
New classes of ULK dielectrics with superior thermomechanical properties
- Yusuke Matsuda
- Sean W. King
- et al.
- 2011
- ADMETA 2011
Extending photo-patternable low-κ concept to 193 nm lithography and e-beam lithography
- Qinghuang Lin
- Alshakim Nelson
- et al.
- 2011
- SPIE Advanced Lithography 2011
Grignard condensation routes to 1,3-disilacyclobutane-containing cyclolinear polycarbosilanes
- Xinxing Liu
- Jitendra S. Rathore
- et al.
- 2017
- J Polym Sci Part A
Moisture-insensitive polycarbosilane films with superior mechanical properties
- Y. Matsuda
- J.S. Rathore
- et al.
- 2012
- ACS AMI
Facile chemical rearrangement for photopatterning of POSS derivatives
- Jitendra Rathore
- Qiu Dai
- et al.
- 2011
- Journal of Materials Chemistry
Cyclolinear polycarbosilanes - A recent addition to the class of organosilicon polymers
- Leonard V. Interrante
- Jitendra S. Rathore
- 2010
- Dalton Transactions
A photocurable, photoluminescent, polycarbosilane obtained by acyclic diene metathesis (ADMET) polymerization
- Jitendra S. Rathore
- Leonard V. Interrante
- 2009
- Macromolecules
Ultra low-k films derived from hyperbranched polycarbosilanes (HBPCS)
- Jitendra S. Rathore
- Leonard V. Interrante
- et al.
- 2008
- Advanced Functional Materials