Top-surface-imaging resist for deep UV lithography
- Scott A. MacDonald
- H. Schlosser
- et al.
- 1991
- International Technical Conference on Photopolymers 1991
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99 results for Robert Allen
Polymer effects on the photochemistry of triarylsulfonium salts
- D.R. McKean
- R.D. Allen
- et al.
- 1991
- SPIE San Diego 1991
Investigations on the structural morphology of sulfonium salt containing polymethacrylate films
- R.D. Allen
- U. Schaedeli
- et al.
- 1989
- ACS PMSE 1989
Silicon-rich surfaces in polymer resists
- R.D. Allen
- Scott A. MacDonald
- 1989
- International SAMPE Electronics Conference 1989
Silicon oxidation during bilayer resist etching
- Mark A. Hartney
- Justin N. Chiang
- et al.
- 1989
- Proceedings of SPIE 1989
Novel photoresist design based on electrophilic aromatic substitution
- B. Reck
- R.D. Allen
- et al.
- 1988
- SPE Regional Technical Conference 1988
Synthesis and properties of xylenyl ether-dimethylsiloxane triblock polymers
- Robert D. Allen
- James L. Hedrick
- 1988
- Polymer Bulletin
A 2-layer resist system derived from trimethylsilylstyrene
- S.A. Macdonald
- R.D. Allen
- et al.
- 1989
- Proceedings of SPIE 1989
Preparation of high purity, anionic polymerization grade alkyl methacrylate monomers
- R.D. Allen
- T.E. Long
- et al.
- 1986
- Polymer Bulletin