Leveraging resist chemistry research for water purification membrane technology
- Robert D. Allen
- Young-Hye Na
- et al.
- 2010
- J. Photopolym. Sci. Tech.
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99 results for Robert Allen
A silicon-containing resist for immersion lithography
- Ratnam Sooriyakumaran
- Wu-Song Huang
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Multi-level integration of patternable low-κ material into advanced Cu BEOL
- Qinghuang Lin
- Shyng-Tsong Chen
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
Novel thin film composite membrane containing ionizable hydrophobes: PH-dependent reverse osmosis behavior and improved chlorine resistance
- Young-Hye La
- Ratnam Sooriyakumaran
- et al.
- 2010
- Journal of Materials Chemistry
Investigation of polymer-bound PAGs: Synthesis, characterization and initial structure/property relationships of anion-bound resists
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2009
- J. Photopolym. Sci. Tech.
Self-segregating materials for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2008
- SPIE Advanced Lithography 2008
The limitations of high index resists for 193nm hyper-NA lithography
- Gregory McIntyre
- Daniel Sanders
- et al.
- 2008
- SPIE Advanced Lithography 2008
A new class of low bake resists for 193-nm immersion lithography
- Ratnam Sooriyakumaran
- Richard DiPietro
- et al.
- 2008
- SPIE Advanced Lithography 2008
Graded spin-on organic bottom antireflective coating for high NA lithography
- Dario L. Goldfarb
- Sean D. Burns
- et al.
- 2008
- SPIE Advanced Lithography 2008
A fundamental study on dissolution behavior of high-resolution molecular glass photoresists
- Anuja De Silva
- Linda K. Sundberg
- et al.
- 2008
- Chemistry of Materials