Graded spin-on organic bottom antireflective coating for high na immersion lithography
- Dario L. Goldfarb
- Libor Vyklicky
- et al.
- 2008
- J. Photopolym. Sci. Tech.
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99 results for Robert Allen
Trends in patterning materials for advanced lithography
- Robert D. Allen
- 2007
- J. Photopolym. Sci. Tech.
Fluoroalcohol materials with tailored interfacial properties for immersion lithography
- Daniel P. Sanders
- Linda K. Sundberg
- et al.
- 2007
- SPIE Advanced Lithography 2007
Contact angles & structure/surface property relationships of immersion materials 65191Q
- Linda K. Sundberg
- Daniel P. Sanders
- et al.
- 2007
- SPIE Advanced Lithography 2007
Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nanoimprint lithography
- Frances A. Houle
- Ann Fornof
- et al.
- 2007
- SPIE Advanced Lithography 2007
Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy
- Vivek M. Prabhu
- Sharadha Sambasivan
- et al.
- 2006
- Applied Surface Science
Fundamental properties of fluoroalcohol-methacrylate polymers for use in 193nm lithography
- R.D. Allen
- G. Breyta
- et al.
- 2006
- J. Photopolym. Sci. Tech.
ArF excimer laser resists based on fluoroalcohol
- Hiroshi Ito
- H.D. Truong
- et al.
- 2006
- Polymers for Advanced Technologies
Molecular resists based on Polyhedral Oligomeric Silsesquioxanes (POSS)
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- Microlithography 2005
193nm single layer photoresists: Defeating tradeoffs with a new class of fluoropolymers
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- Microlithography 2005