Simulation of photoresist defect transfer through subsequent patterning processes
- Dominik Metzler
- Mohamed Oulmane
- et al.
- 2020
- SPIE Advanced Lithography 2020
Publications
Date
Featured collections
Popular topics
2 results for Mohamed Oulmane
Guiding gate-etch process development using 3D surface reaction modeling for 7nm and beyond
- Derren Dunn
- John R. Sporre
- et al.
- 2017
- SPIE Advanced Lithography 2017