Bayesian dropout approximation in deep learning neural networks: Analysis of self-aligned quadruple patterning
- Scott D. Halle
- Max O. Bloomfield
- et al.
- 2020
- SPIE Advanced Lithography 2020
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4 results for Max O. Bloomfield
Thermomechanical behavior of EUV pellicle under dynamic exposure conditions
- Dario Goldfarb
- Max O. Bloomfield
- et al.
- 2016
- SPIE Advanced Lithography 2016
Component-based workflows for parallel thermomechanical analysis of arrayed geometries
- Max O. Bloomfield
- Zhen Li
- et al.
- 2016
- Engineering with Computers
Bayesian dropout approximation in deep learning neural networks: Analysis of self-Aligned quadruple patterning
- Scott D. Halle
- Derren N. Dunn
- et al.
- 2022
- JM3