Modeling and parameter tuning for templated directed self-Assembly
- Balint Meliorisz
- T. Mülders
- et al.
- 2016
- SPIE Advanced Lithography 2016
Publications
Date
Featured collections
Popular topics
5 results for Ananthan Raghunathan
Best focus shift mechanism for thick masks
- Martin Burkhardt
- Ananthan Raghunathan
- 2015
- SPIE Advanced Lithography 2015
Implementation of assist features in EUV lithography
- Fan Jiang
- Martin Burkhardt
- et al.
- 2015
- SPIE Advanced Lithography 2015
Revisit pattern collapse for 14nm node and beyond
- Kenji Yoshimoto
- Craig Higgins
- et al.
- 2011
- SPIE Advanced Lithography 2011
Design technology co-optimization assessment for directed self-Assembly-based lithography: Design for directed self-Assembly or directed self-Assembly for design
- Kafai Lai
- Chi Chun Liu
- et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS