Surface initiated polymer thin films for the area selective deposition and etching of metal oxides
- Thomas G. Pattison
- Alexander E. Hess
- et al.
- 2020
- ACS Nano
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4 results for Alexander E. Hess
EUV chemically amplified resist component distribution and efficiency for stochastic defect control
- Dario Goldfarb
- Olivia Wang
- et al.
- 2020
- SPIE Advanced Lithography 2020
Study of resist hardmask interaction through surface activation layers
- Anuja De Silva
- Luciana Meli
- et al.
- 2018
- EUVL 2018
Extending the compositional diversity of films in area selective atomic layer deposition through chemical functionalities
- Magi Mettry
- Alexander E. Hess
- et al.
- 2019
- JVSTA