Lithographic qualification of high-Transmission mask blank for 10nm node and beyondYongan XuTom Faureet al.2016SPIE Advanced Lithography 2016
Growth of crystalline defects on the surface of FSG dielectricsJ.P. GambinoJ. Burnhamet al.2003AMC 2003
Film properties and integration of a composite PECVD FSG filmR. WistromG. Bombergeret al.2002IITC 2002