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Enhanced grain growth of phosphorus-doped polycrystalline silicon by titanium silicide formationT.C. ChouC.Y. Wonget al.1986Applied Physics Letters
Effect of temperature on electrical and microstructural changes of coevaporated Ir-Si alloy filmsB.Z. WeissK.N. Tuet al.1986Journal of Applied Physics
Titanium-tungsten contacts to silicon. II. Stability against aluminum penetrationS.E. BabcockK.N. Tu1986Journal of Applied Physics
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