Formation and Schottky behavior of manganese silicides on n-type silicon
- M. Eizenberg
- K.N. Tu
- 1982
- Journal of Applied Physics
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Thermal stability and growth kinetics of Co2Si and CoSi in thin-film reactions
- K.N. Tu
- G. Ottaviani
- et al.
- 1982
- Journal of Applied Physics
Growth kinetics of planar binary diffusion couples: "Thin-film case" versus "bulk cases"
- U. Gösele
- K.N. Tu
- 1982
- Journal of Applied Physics
NiSi formation at the silicide/Si interface on the NiPt/Si system
- G. Ottaviani
- K.N. Tu
- et al.
- 1982
- Journal of Applied Physics
Titanium-tungsten contacts to Si: The effects of alloying on Schottky contact and on silicide formation
- S.E. Babcock
- K.N. Tu
- 1982
- Journal of Applied Physics
Laser writing on silicon-metal bilayers for optical storage. II. Microscopic study
- S.R. Herd
- K.N. Tu
- et al.
- 1982
- Journal of Applied Physics
Ion-beam-induced metastable Pt2Si3 phase. III. Structure and diffusion in amorphous Pt2Si3
- J.F. Graczyk
- K.N. Tu
- et al.
- 1982
- Journal of Applied Physics
A simple analysis of inert marker motion in a single compound layer for solid-phase epitaxy and for binary diffusion couples
- U. Gösele
- K.N. Tu
- et al.
- 1982
- Journal of Applied Physics
A study of vanadium as diffusion barrier between aluminum and gadolinium silicide contacts
- M. Eizenberg
- R.D. Thompson
- et al.
- 1982
- Journal of Applied Physics
Formation of shallow silicide contacts of high Schottky barrier on Si: Alloying Pd and Pt with W versus alloying Pd and Pt with Si
- M. Eizenberg
- K.N. Tu
- 1982
- Journal of Applied Physics