Publications

150 results for Matthew Copel

Thermally stable ultra-thin Zr silicate for CMOS applications
- - Z. Luo
  - T.P. Ma
  - et al.
- 2001
- International Symposium on VLSI Technology, Systems, and Applications, Proceedings
80 nm poly-silicon gated n-FETs with ultra-thin Al₂O₃ gate dielectric for ULSI applications
- - D.A. Buchanan
  - E. Gusev
  - et al.
- 2000
- IEDM 2000
Atomic beam deposition of lanthanum- and yttrium-based oxide thin films for gate dielectrics
- - S. Guha
  - E. Cartier
  - et al.
- 2000
- Applied Physics Letters
Low temperature chemical vapor deposition of ZrO₂ on Si(100) using anhydrous zirconium(IV) nitrate
- - Ryan C. Smith
  - Noel Hoilien
  - et al.
- 2000
- JES
Optimizing fabrication of buried oxide channel field effect transistors
- - A.G. Schrott
  - J. Misewich
  - et al.
- 2000
- MRS Proceedings 2000
Structure and stability of ultrathin zirconium oxide layers on Si(001)
- - M. Copel
  - M. Gribelyuk
  - et al.
- 2000
- Applied Physics Letters
High-resolution depth profiling in ultrathin Al₂O₃ films on Si
- - E. Gusev
  - M. Copel
  - et al.
- 2000
- Applied Physics Letters
Nucleation of chemical vapor deposited silicon nitride on silicon dioxide
- - M. Copel
  - P.R. Varekamp
  - et al.
- 1999
- Applied Physics Letters
Ultrathin nitrided gate dielectrics by plasma-assisted processing
- - E. Gusev
  - D.A. Buchanan
  - et al.
- 1999
- Microelectronic Engineering
Compensation doping of Ba_0.7Sr_0.3TiO₃ thin films
- - M. Copel
  - J.D. Baniecki
  - et al.
- 1998
- Applied Physics Letters