Impact of high-NA half-field to full-field overlay performance by Monte Carlo simulationsRomain LallementDaniel Schmidtet al.2023OEN 2023
Overlay Performance in Permanent Bonded Wafer Integration SchemesNathan IpMichael Belyanskyet al.2023SPIE Advanced Lithography + Patterning 2023
Predicting overlay mark performance based on process emulation and optical simulationSagarika MukeshJack Wonget al.2022SPIE Advanced Lithography 2022