Mixed e-beam/optical lithography process for the fabrication of sub-0.25-μm poly gates
- Keith T. Kwietniak
- Michael G. Rosenfield
- et al.
- 1993
- Microlithography 1993
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19 results for Michael Rosenfield
Overlay measurements using the scanning electron microscope: accuracy and precision
- Michael G. Rosenfield
- 1992
- Microlithography 1992
Overlay measurement using the low voltage scanning electron microscope
- Michael G. Rosenfield
- A. Starikov
- 1992
- Microelectronic Engineering
A study of proximity effects at high electron-beam voltages for x-ray mask fabrication part 1: Additive mask processes
- Michael G. Rosenfield
- S. Rishton
- et al.
- 1991
- Microelectronic Engineering
The use of the low voltage SEM in IC fabrication
- Michael G. Rosenfield
- 1991
- Scanning
Determination of proximity effect correction parameters for 0.1 μm electron-beam lithography
- Michael G. Rosenfield
- S.J. Wind
- et al.
- 1990
- Microelectronic Engineering
Contrast and sensitivity trade-offs of resist processing in electron beam lithography at 0.5µm and below
- W. Molzen
- Michael G. Rosenfield
- et al.
- 1989
- Proceedings of SPIE 1989
ANALYSIS OF BACKSCATTERED ELECTRON SIGNALS FOR X-RAY MASK INSPECTION.
- Michael G. Rosenfield
- 1985
- Scanning Electron Microscopy
COMPARISON OF BACKSCATTERED ELECTRON AND OPTICAL IMAGES FOR SUBMICRON DEFECT DETECTION.
- Michael G. Rosenfield
- Douglas S. Goodman
- et al.
- 1984
- Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena