OCD enhanced: Implementation and validation of spectral interferometry for nanosheet inner spacer indentation
- Daniel Schmidt
- C. Durfee
- et al.
- 2021
- SPIE Advanced Lithography 2021
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4 results for S. Wolfling
Advanced in-line optical metrology of sub-10nm structures for gate all around devices (GAA)
- R. Muthinti
- Nicolas Loubet
- et al.
- 2016
- SPIE Advanced Lithography 2016
Advanced in-line metrology strategy for self-aligned quadruple patterning
- Robin Chao
- Mary Breton
- et al.
- 2016
- SPIE Advanced Lithography 2016
Scatterometry-based defect detection for DSA in-line process control
- Robin Chao
- Chi Chun Liu
- et al.
- 2015
- SPIE Advanced Lithography 2015