Phase calibration for attenuating phase-shift masks
- Michael S. Hibbs
- Timothy A. Brunner
- 2006
- SPIE Advanced Lithography 2006
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40 results for Timothy Brunner
Immersion lithography: New opportunities for semiconductor manufacturing
- Darío Gil
- Timothy A. Brunner
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Hardmask technology for sub-100 nm lithographic imaging
- Katherina Babich
- Arpan P. Mahorowala
- et al.
- 2003
- Microlithography 2003
High numerical aperture lithographic imagery at the Brewster angle
- Timothy A. Brunner
- Nakgeuon Seong
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Linewidth variation characterization by spatial decomposition
- Alfred K. Wong
- Antoinette F. Molless
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
High NA lithographic imagery at Brewster's angle
- Timothy A. Brunner
- Nakgeuon Seong
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
High numerical aperture-imaging implications for chemically amplified photoresists
- Martha I. Sanchez
- Frances A. Houle
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Characterization of line width variation
- Alfred K. Wong
- Antoinette F. Molless
- et al.
- 2000
- SPIE Advanced Lithography 2000
Relationship between the slope of the HD curve and the fundamental resist process contrast
- Timothy A. Brunner
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Extension of 248 nm optical lithography: A thin film imaging approach
- Qinghuang Lin
- Ahmad D. Katnani
- et al.
- 1998
- Microlithography 1998