Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk
- David Fryer
- Michael Lam
- et al.
- 2014
- SPIE Advanced Lithography 2014
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3 results for Christian Zuniga
The trade-offs between thin and thick absorbers for EUV photomasks
- Gregory McIntyre
- Christian Zuniga
- et al.
- 2011
- SPIE Photomask Technology + EUV Lithography 2011
EUV OPC for 56 nm metal pitch
- Martin Burkhardt
- Matt Colburn
- et al.
- 2011
- SPIE Advanced Lithography 2011