Chemically amplified photoresist for visible laser direct imaging
- G.M. Wallraff
- R.D. Allen
- et al.
- 1991
- ACS Spring 1991
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6 results for John Sturtevant
Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk
- David Fryer
- Michael Lam
- et al.
- 2014
- SPIE Advanced Lithography 2014
Improved reflectivity control of APEX-E positive tone deep-UV photoresist
- Willard Conley
- Ravindra Akkapeddi
- et al.
- 1994
- Microlithography 1994
Use of scatterometric latent image detector in closed loop feedback control of linewldth
- John Sturtevant
- Steve Holmes
- et al.
- 1994
- Microlithography 1994
Post-exposure bake as a process-control parameter for chemically-amplffied photoresist
- John L. Sturtevant
- Steven J. Holmes
- et al.
- 1993
- Microlithography 1993
Relationship of photoacid production and fluorescence quenching of anthryl sensitizers by aryl iodonium and sulfonium salts
- G.M. Wallraff
- D.R. McKean
- et al.
- 1989
- ACS PMSE 1989