Temperature dependence of TDDB voltage acceleration in high-κ/ SiO2 bilayers and SiO2 gate dielectricsErnest WuJordi Suñéet al.2012IEDM 2012
Time-dependent clustering model versus combination-based approach for BEOL/MOL and FEOL non-uniform dielectric breakdown: Similarities and disparitiesErnest Y. WuBaozhen Liet al.2014IRPS 2014
Generalized successive failure methodology for non-Weibull distributions and its applications to SiO 2 or high-k/SiO 2 bilayer dielectrics and extrinsic failure modeErnest WuJordi Suñéet al.2012IRPS 2012