Resist-based polarization monitoring for 193nm high-numerical aperture lithography
- Richard Tu
- Gregory McIntyre
- 2008
- Lithography Asia 2008
Publications
Date
Featured collections
Popular topics
23 results for Greg McIntyre
Monitoring polarization at 193nm high-numerical aperture with phase shift masks: Experimental results and industrial outlook
- Gregory McIntyre
- Richard Tu
- 2008
- SPIE Advanced Lithography 2008
Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- Greg McIntyre
- Michael Hibbs
- et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS