Learning from native defects on EUV mask blanks
- Emily Gallagher
- Alfred Wagner
- et al.
- 2014
- SPIE Optics + Photonics 2014
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4 results for Steven Nash
Two-dimensional mask effects at the 14 nm logic node
- A.E. Zweber
- A.E. McGuire
- et al.
- 2013
- SPIE Photomask Technology 2013
Using pattern shift to avoid blank defects during EUVL mask fabrication
- Yoshiyuki Negishi
- Yuki Fujita
- et al.
- 2013
- Photomask and Next-Generation Lithography Mask Technology 2013
High-accuracy defect-free X-Ray mask technology
- Steven C. Nash
- Thomas B. Faure
- et al.
- 1994
- Japanese Journal of Applied Physics