Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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66 results for Martha I. Sanchez
High numerical aperture lithographic imagery at the Brewster angle
- Timothy A. Brunner
- Nakgeuon Seong
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Method of measuring the spatial resolution of a photoresist
- J. Hoffnagle
- W.D. Hinsberg
- et al.
- 2002
- Optics Letters
Kinetic model for positive tone resist dissolution and roughening
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2002
- Macromolecules
Product volatilization as a probe of the physics and chemistry of latent image formation in chemically amplified resists
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2002
- Journal of Physical Chemistry A
Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns
- Cattien V. Nguyen
- Ramsey M. D. Stevens
- et al.
- 2002
- Applied Physics Letters
Influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist
- F.A. Houle
- W.D. Hinsberg
- et al.
- 2002
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High NA lithographic imagery at Brewster's angle
- Timothy A. Brunner
- Nakgeuon Seong
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
EUV photoresist performance results from the VNL and the EUV LLC
- Jonathan Cobb
- Paul Dentinger
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
Carbon nanotube scanning probe for surface profiling of DUV and 193 nm photoresist pattern
- Cattien V. Nguyen
- Ramsey M. D. Stevens
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering