Contact mask optimization and SRAF design
- Uwe P. Schroeder
- Cyrus Tabery
- et al.
- 2009
- SPIE Advanced Lithography 2009
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4 results for Uwe Schroeder
Patterning strategies for gate level tip-tip distance reduction in SRAM cell for 45nm and beyond
- Haoren Zhuang
- Helen Wang
- et al.
- 2007
- ISTC 2007
Modular 0.13 μm bulk CMOS technology for high performance and low power applications
- L.K. Han
- S. Biesemans
- et al.
- 2000
- VLSI Technology 2000
Roadmap on ferroelectric hafnia- and zirconia-based materials and devices
- José P. B. Silva
- Ruben Alcala
- et al.
- 2023
- APL Materials