Quantifying non-centrosymmetric orthorhombic phase fraction in 10 nm ferroelectric Hf0.5Zr0.5O2films
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- Steven Consiglio
- et al.
- 2020
- Applied Physics Letters
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High quality interfacial layer formation for Si0.75Ge0.25 (100) high-k metal gate stack
- S. Siddiqui
- R. Galatage
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- 2020
- Microelectronic Engineering