Antiadhesion considerations for UV nanoimprint lithography
- F.A. Houle
- C.T. Rettner
- et al.
- 2007
- Applied Physics Letters
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54 results for Dolores Miller
Poly(methyl α‐trifluoromethylacrylate) as a positive electron beam resist
- C. Grant Willson
- Hiroshi Ito
- et al.
- 2004
- Polymer Engineering & Science
Radical Copolymerization of 2-Trifluoromethylacrylic Monomers. III. Kinetics and Monomer Reactivities in the Copolymerization of t-Butyl 2-Trifluoromethylacrylate and Methacrylate with Styrene Bearing Hexafluoroisopropanol
- Hiroshi Ito
- Masaki Okazaki
- et al.
- 2004
- J Polym Sci Part A
Radical Copolymerization of 2-Trifluoromethylacrylic Monomers. II. Kinetics, Monomer Reactivities, and Penultimate Effect in Their Copolymerization with Norbornenes and Vinyl Ethers
- Hiroshi Ito
- Masaki Okazaki
- et al.
- 2004
- J Polym Sci Part A
Radical Copolymerization of 2-Trifluoromethylacrylic Monomers. I. Kinetics of Their Copolymerization with Norbornenes and Vinyl Ethers as Studied by in situ 1H NMR Analysis
- Hiroshi Ito
- Dolores C. Miller
- 2004
- J Polym Sci Part A
Microstructure and properties of ultrathin amorphous silicon nitride protective coating
- Bing K. Yen
- Richard L. White
- et al.
- 2003
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Polymerization of Methyl α-(Trifluoromethyl)acrylate and α-(Trifluoromethyl)acrylonitrile and Copolymerization of These Monomers with Methyl Methacrylate
- Hiroshi Ito
- Dolores C. Miller
- et al.
- 2002
- Macromolecules
Characteristics of the Surface-Induced Orientation for Symmetric Diblock PS/PMMA Copolymers
- T.P. Russell
- G. Coulon
- et al.
- 2002
- Macromolecules
Aliphatic platforms for the design of 157 nm chemically amplified resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Polymer design for 157 nm chemically amplified resists
- Hiroshi Ito
- Greg M. Wallraff
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering