The effects of vacuum ultraviolet radiation on low-k dielectric films
- H. Sinha
- H. Ren
- et al.
- 2012
- Journal of Applied Physics
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Synergistic combinations of dielectrics and metallization process technology to achieve 22 nm interconnect performance targets
- G.A. Antonelli
- G. Jiang
- et al.
- 2012
- Microelectronic Engineering