Selective dry etching of germanium with respect to silicon and vice versa
- G.S. Oehrlein
- T.D. Bestwick
- et al.
- 2019
- JES
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118 results for Gottlieb S. Oehrlein
Surface Modifications of Electronic Materials Induced by Plasma Etching
- G.S. Oehrlein
- S.W. Robey
- et al.
- 2019
- JES
Near-Surface Damage and Contamination after CF4/H2 Reactive Ion Etching of Si
- G.S. Oehrlein
- R.M. Tromp
- et al.
- 2019
- JES
Electrical studies on annealed d2 plasma-exposed silicon
- A. Henry
- O.O. Awadelkarim
- et al.
- 2019
- JES
Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: A physics and chemistry perspective
- Kenji Ishikawa
- Tatsuo Ishijima
- et al.
- 2019
- Japanese Journal of Applied Physics
Achieving ultrahigh etching selectivity of SiO2 over Si3N4 and Si in atomic layer etching by exploiting chemistry of complex hydrofluorocarbon precursors
- Kang Yi Lin
- Chen Li
- et al.
- 2018
- JVSTA
Polymer etching by atmospheric-pressure plasma jet and surface micro-discharge sources: Activation energy analysis and etching directionality
- Andrew J. Knoll
- Pingshan Luan
- et al.
- 2018
- Plasma Processes and Polymers
Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
- Dominik Metzler
- Chen Li
- et al.
- 2016
- Journal of Chemical Physics
He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching
- Dominik Metzler
- Florian Weilnboeck
- et al.
- 2016
- JVSTB
Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
- Dominik Metzler
- Chen Li
- et al.
- 2016
- JVSTA