Improvements in profile control using ISPC™ system during the stop-in-oxide CMP step in the RMG process flow on IBM 20nm short-loop wafers
- P. Komarenko
- J. Qian
- et al.
- 2012
- ICPT 2012
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High performance bulk planar 20nm CMOS technology for low power mobile applications
- Huiling Shang
- Sameer Jain
- et al.
- 2012
- VLSI Technology 2012