Gas cluster ion beam processing for improved self aligned contact yield at 7 nm node FinFET: MJ: MOL and junction interfacesSu Chen FanSean Teehanet al.2018ASMC 2018
Modifications of growth of strained silicon and dopant activation in silicon by cryogenic ion implantation and recrystallization annealingHiroshi ItokawaNathaniel C. Beriineret al.2012IWJT 2012
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