EUV OPC for 56 nm metal pitch
- Martin Burkhardt
- Matt Colburn
- et al.
- 2011
- SPIE Advanced Lithography 2011
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Thorough characterization of a EUV mask
- Hiroyuki Mizuno
- Gregory McIntyre
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- 2009
- Photomask and Next-Generation Lithography Mask Technology 2009