Characterization and analysis of gate-induced-drain-leakage current in 45 nm CMOS technology
- Xiaobin Yuan
- Jae-Eun Park
- et al.
- 2007
- IIRW 2007
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5 results for Jae-Eun Park
Modeling MOSFET process variation using PSP
- Josef Watts
- Yoo-Mi Lee
- et al.
- 2007
- NSTI-Nanotech 2007
High performance thick copper inductors in an RF technology
- Kunal Vaed
- William Graham
- et al.
- 2004
- SPIE Micromachining and Microfabrication 2004
Transistor mismatch properties in deep-submicrometer CMOS technologies
- Xiaobin Yuan
- Takashi Shimizu
- et al.
- 2011
- IEEE T-ED
Gate-induced-drain-leakage current in 45-nm CMOS technology
- Xiaohin Yuan
- Jae-Eun Park
- et al.
- 2008
- IEEE T-DMR