The interaction of CF3 radicals and CF3 radical precursors with SiO2 surfaces
- F.R. McFeely
- J.A. Yarmoff
- et al.
- 1988
- Surface Science
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30 results for Jory A. Yarmoff
Mechanism for chemical-vapor deposition of tungsten on silicon from tungsten hexafluoride
- Jory A. Yarmoff
- F. Read McFeely
- 1988
- Journal of Applied Physics
Microscopic structure of the SiO2/Si interface
- F.J. Himpsel
- F.R. McFeely
- et al.
- 1988
- Physical Review B
Effect of sample doping level during etching of silicon by fluorine atoms
- J.A. Yarmoff
- F.R. McFeely
- 1988
- Physical Review B
Interaction of hexafluoroazomethane with Si(111)
- F.R. McFeely
- J.A. Yarmoff
- et al.
- 1988
- The Journal of Chemical Physics
Dielectrics on semiconductors
- F.J. Himpsel
- U.O. Karlsson
- et al.
- 1988
- Materials Science and Engineering B
Oxygen removal from Si via reaction with adsorbed Ge
- J.F. Morar
- B.S. Meyerson
- et al.
- 1987
- Applied Physics Letters
Valence electronic structure of Y1Ba2Cu3O7
- J.A. Yarmoff
- D.R. Clarke
- et al.
- 1987
- Physical Review B
Mechanism of ion-assisted etching of silicon by fluorine atoms
- J.A. Yarmoff
- F.R. McFeely
- 1987
- Surface Science
Electronic structure of the CaF2/Si(111) interface
- D. Rieger
- F.J. Himpsel
- et al.
- 1986
- Physical Review B