Evaluation of barrier CMP slurries and characterization of ULK material properties shifts due to CMP
- Wei-Tsu Tseng
- Dimitri Kioussis
- et al.
- 2008
- ECS Meeting 2008
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Enabling scatterometry as an in-line measurement technique for 32 nm BEOL application
- M. Golam Faruk
- Shahin Zangooie
- et al.
- 2011
- IEEE Trans Semicond Manuf