Quantitative stepper metrology using the focus monitor test mask
- T.A. Brunner
- A.L. Martin
- et al.
- 1994
- Microlithography 1994
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15 results for Mike Hibbs
Lithographic qualification of new opaque MoSi binary mask blank for the 32-nm node and beyond
- Greg McIntyre
- Michael Hibbs
- et al.
- 2010
- J. Micro/Nanolithogr. MEMS MOEMS
Evaluation of molybdenum silicide for use as a 193 nm phase-shifting absorber in photomask manufacturing
- M. Hibbs
- M. Ushida
- et al.
- 2001
- Proceedings of SPIE- The International Society for Optical Engineering
Optimum mask and source patterns to print a given shape
- Alan E. Rosenbluth
- Scott Bukofsky
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Novel Si-based composite thin films for 193/157 nm attenuated phase shift mask(APSM) applications
- S. Jay Chey
- C.R. Guarnieri
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering