Electrodes and barriers for dram and feram: Processing, integration, and fundamentals
- K.L. Saenger
- P.C. Andricacos
- et al.
- 2001
- MRS Online Proceedings Library
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17 results for Keith Kwietniak
Mixed e-beam/optical lithography process for the fabrication of sub-0.25-μm poly gates
- Keith T. Kwietniak
- Michael G. Rosenfield
- et al.
- 1993
- Microlithography 1993
Contrast and sensitivity trade-offs of resist processing in electron beam lithography at 0.5µm and below
- W. Molzen
- Michael G. Rosenfield
- et al.
- 1989
- Proceedings of SPIE 1989
Submicrometer Platinum Electrodes by Through-Mask Plating
- K.L. Saenger
- G. Costrini
- et al.
- 2001
- JES
Improved underlayers for acid amplified resists
- H.S. Sachdev
- R.W. Kwong
- et al.
- 1994
- Microelectronic Engineering
On the preparation of cross-sectional TEM samples using lithographic processing and reactive ion-etching
- J.T. Wetzel
- M. Jost
- et al.
- 1989
- Ultramicroscopy
Fully scaled 0.5 μm MOS cicuits by synchroton X-ray lithography: Resist systems and line width control
- David Seeger
- K.T. Kwietniak
- et al.
- 1989
- Microelectronic Engineering