Blanket SMT with in situ N2 plasma treatment on the lang;100〉 wafer for the low-cost low-power technology application
- Jun Yuan
- Victor Chan
- et al.
- 2009
- IEEE Electron Device Letters
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Modeling gate-pitch scaling impact on stress-induced mobility and external resistance for 20nm-node MOSFETs
- Seong-Dong Kim
- Sameer Jain
- et al.
- 2010
- SISPAD 2010